Key
Features






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PHARMACEUTICAL APPLICATIONS |
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Cilas brings forty years of experience
developing solutions in particle size analysis. All our
instruments are calibrated to the ISO 13320 standard, meaning
accurate and repeatable measurements.
Our software is CFR 21 Part 11 compliant for
complete traceability of results. A small volume
dispersion unit is available for expensive samples. The
extended measurement range of the Cilas 1190 allows you to
analyze the widest range of particles.
All Cilas systems are fully compliant with the
<USP 429> standard, addressing laser particle size method
validation for the evaluation of intermediate precision,
repeatability and robustness. Compliance to <USP 429>
means that our particle size analyzers feature the recommended
theoretical treatment used for analysis based on both
Fraunhofer diffraction, for small angle (large particle size),
and MIE theory, for wider angle (small particle size), to
distinguish between scattering by small single particles and
scattering by clusters of particles. This compliance
gives you confidence that all results measured by Cilas laser
particle size analyzers follow the specific guidelines for
technical performance.
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Come and see our solutions at the following trade shows:
Cevisama
Valencia, Spain
February 8 - 11, 2011
Pittcon 2011
Booth 3323
Atlanta, GA
March 14 - 17, 2011
Particle Society of
Minnesota
Roseville, MN
March 2011
Regional Refractories
St. Louis, MO
March 2011
Analytica
Munich, Germany
March 2011
Chicago Catalyst Show
Chicago, IL
May 2011
Powder and Bulk
Engineering Northeast
Booth 431
Somerset, NJ
May 23 - 25, 2011
Forum Labo
Paris, France
June 2011
Southeast Catalyst Show
Asheville, NC
September 2011
Nanotechnology
Symposium 2011
Louisville, KY
September 23 - 24, 2011
Powtech
Nuremberg, Germany
October 11 - 13, 2011
MS&T 11
Booth 733
Columbus, OH
October 16 - 20, 2011
American
Association of Pharmaceutical Scientists 2011
Booth 2255
Washington, DC
October 23 - 27, 2011
International
Symposium
on Inorganic Phosphate Materials
Argonne, IL
November 8 - 11, 2011 |
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